Product introduction
NF-300H TEOS
PECVD equipment
Product introduction
NF-300H TEOS equipment is a product independently developed by Piotech. It can realize high throughput for long-deposition-time processes. The design achieved technological breakthroughs in film uniformity and roughness, film stress and particle control, and in productivity.
Product features
NF-300H TEOS
PECVD equipment
Product Features
- High productivity design with fast switching between multiple types of thin film deposition
- It can realize high throughput for long-deposition-time processes
- Meet the requirements of high temperature deposition at 300-600 ℃
- The process chamber can be used for multiple wafer deposition
- Passed S2 safety certification
